JPH0451416Y2 - - Google Patents
Info
- Publication number
- JPH0451416Y2 JPH0451416Y2 JP15509686U JP15509686U JPH0451416Y2 JP H0451416 Y2 JPH0451416 Y2 JP H0451416Y2 JP 15509686 U JP15509686 U JP 15509686U JP 15509686 U JP15509686 U JP 15509686U JP H0451416 Y2 JPH0451416 Y2 JP H0451416Y2
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- detector
- ray detector
- protective container
- ray
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000001681 protective effect Effects 0.000 claims description 26
- 238000001816 cooling Methods 0.000 claims description 21
- 239000003507 refrigerant Substances 0.000 claims description 2
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 claims 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- 239000007789 gas Substances 0.000 description 11
- 230000007423 decrease Effects 0.000 description 10
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 239000003463 adsorbent Substances 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- 229910052790 beryllium Inorganic materials 0.000 description 2
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15509686U JPH0451416Y2 (en]) | 1986-10-09 | 1986-10-09 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15509686U JPH0451416Y2 (en]) | 1986-10-09 | 1986-10-09 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6360263U JPS6360263U (en]) | 1988-04-21 |
| JPH0451416Y2 true JPH0451416Y2 (en]) | 1992-12-03 |
Family
ID=31075491
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15509686U Expired JPH0451416Y2 (en]) | 1986-10-09 | 1986-10-09 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0451416Y2 (en]) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008128635A (ja) * | 2006-11-16 | 2008-06-05 | Shimadzu Corp | 電子冷却型半導体ｘ線検出器 |
-
1986
- 1986-10-09 JP JP15509686U patent/JPH0451416Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6360263U (en]) | 1988-04-21 |
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